2010_11
Guia docent 
Escola Tècnica Superior d'Enginyeria Química
A A A 
català 
Nanociència i Nanotecnologia (2010)
 Assignatures
  NANOFABRICACIÓ I NANOPROCESSAT
   Continguts
Tema Subtema
Chapter 0. Introduction and preliminary concepts.
Chapter 1. Visible and ultraviolet lithography. Concept of optical lithography. Conventional optical lithography. Resists. Equipment. Microelectronics as driving force for miniaturization. Limits of optical lithography. Advanced optical lithography.
Chapter 2. Electron-beam lithography.
 Introduction to Electron Beam Lithography. Electron Optics: EBL Systems. Electron-Solid Interactions. Exposure: Resists. Proximity effects. Process Technology. Applications.
Chapter 3. Nanofabrication with polymers. Polymer availability for top-down lithography. Bottom-up lithography with polymers. Block-copolymers. Fabrication of polymer nanostructures.
Chapter 4. Focused ion-beam technology.


 Polymer availability for top-down lithography. Bottom-up lithography with polymers. Block-copolymers. Fabrication of polymer nanostructures.
Chapter 5. Non-conventional lithographic techniques. Lithographies based on near field microscopies: Introduction to Scanning Probe Microscopy. Summary of Scanning Probe Lithography Methods. Atomic manipulation (STM). Manipulation of objects and molecules. Indentation/Local deposition. Local oxidation nanolithography. Local dispensing of liquids and molecules (including Dip Pen nanolithography). Parallel nanofabrication.
Interference or holographic lithography.
Embossing lithographies: Hot embossing and nanoimprinting.
Soft lithographies.
Chapter 6. Non-lithographic nanofabrication methods. Fabrication of nanotemplates. Growth inside the templates. Self-assembling of molecules and crystals. Synthesis of nanotubes, nanowires, nanobelts and nanoparticles.
Chapter 7. Growth and deposition techniques.
 Process of growth. Evaporation. Molecular beam epitaxy. Sputtering. Ion-assited deposition. Laser ablation. Chemical phase deposition. Plasma-assisted deposition. Langmuir-Blodgett deposition method.
Chapter 8. Processing of layers. Wet and dry chemical etching. Lift-off processes. Plasma assisted and reactive etching. Ionic etching.
Chapter 9. Examples.