Type A
|
Code |
Competences Specific | | A1 |
A1.1. Successfully studying and learning about the chosen research ambit: evaluating the technical and scientific importance, the technological potential and the viability of the nanoscience, design, preparation, properties, processes, developments, techniques and applications of materials. |
Type B
|
Code |
Competences Transversal | | B9 |
B1.1. Communicating and discussing proposals and conclusions in specialized and non-specialized multilingual forums in a clear and unambiguous manner. |
| B14 |
B3.1. Collaborative teamwork, with responsibility shared among multidisciplinary, multilingual and multicultural teams. |
| B15 |
B4.1. Continuously learning. |
| B16 |
B4.2 Learning autonomously and by using initiative. |
| B17 |
B5.1. Working autonomously whilst remaining responsible and using initiative, in a research and innovative context. |
| B18 |
B5.2. Solving complex problems in new environments and in innovative and multidisciplinary contexts. |
| B19 |
B5.3. Applying critical, logical and creative thought in a research and innovative context. |
Type C
|
Code |
Competences Nuclear | | C1 |
Have an intermediate mastery of a foreign language, preferably English |
| C2 |
Be advanced users of the information and communication technologies |
| C3 |
Be able to manage information and knowledge |
| C5 |
Be committed to ethics and social responsibility as citizens and professionals |
Type A
|
Code |
Learning outcomes |
| A1 |
A1.1 Can formulate knowledge about the basic principles used in the field of nanofabrication and nanoprocessing, materials and the main techniques used in this area.
A1.1 Select the most appropriate nanofabrication methods to solve specific problems of nanotechnology.
|
Type B
|
Code |
Learning outcomes |
| B9 |
B1.1 Can intervene effectively and transmit relevant information.
B1.1 Plan their communication: generate ideas, seek information, select and order information, make schemes, decide on the audience and the aims of the communication, etc.
B1.1 Prepare and deliver structured presentations, complying with the requirements.
B1.1 Draft documents with the appropriate format, content, structure, language accuracy, and register, and can illustrate concepts using the correct conventions: format, headings, footnotes, captions, etc.
B1.1 Use language that is appropriate to the situation.
B1.1 Are aware of the strategies that can be used in oral presentations (audiovisual support, eye contact, voice, gesture, timing, etc.).
| | B14 |
B3.1 Accept and comply with the rules of the group.
B3.1 Take active part in planning the team’s work, distributing tasks and respecting deadlines.
B3.1 Contribute to the positive management of any differences, disagreements and conflicts that arise in the team.
B3.1 Make their personal contribution in the time expected and with the resources available.
B3.1 Take active part and share information, knowledge and experiences.
B3.1 Take into account the points of view of others and give constructive feedback.
| | B15 |
B4.1 Autonomously adopt the appropriate learning strategies in every situation.
B4.1 Set their own learning objectives.
| | B16 |
B4.2 Ask the appropriate questions for solving doubts or open questions, and search for information with criteria.
B4.2 Select a procedure from among the possibilities suggested by the lecturer.
| | B17 |
B5.1 Analyse their own limitations and potential for undertaking a particular task.
B5.1 Decide how to manage and organize the work and time required to carry out a task from the basis of a general plan.
B5.1 Decide how to manage and organize the work and time.
B5.1 Reflect on their learning process and learning needs.
| | B18 |
B5.2 Direct the decision-making process in a participative manner.
B5.2 Can draw up strategies for solving problems.
B5.2 Can get support from others to guarantee the success of their decisions.
B5.2 Can provide alternative solutions to the same problem and assess possible risks and advantages.
B5.2 Select the information required to solve problems using objective criteria.
| | B19 |
B5.3 Follow a logical method for identifying the causes of a problem.
|
Type C
|
Code |
Learning outcomes |
| C1 |
Express opinions on abstract or cultural topics in a limited fashion.
Explain and justify briefly their opinions and projects.
Understand instructions about classes or tasks assigned by the teaching staff.
Understand routine information and articles.
Understand the general meaning of texts that have non-routine information in a familiar subject area.
Write letters or take notes about foreseeable, familiar matters.
| | C2 |
Understand basic computer hardware.
Understand the operating system as a hardware manager and the software as a working tool.
Use software for off-line communication: word processors, spreadsheets and digital presentations.
Use software for on-line communication: interactive tools (web, moodle, blogs, etc.), e-mail, forums, chat rooms, video conferences, collaborative work tools, etc.
| | C3 |
Locate and access information effectively and efficiently.
Critically evaluate information and its sources, and add it to their own knowledge base and system of values.
Have a full understanding of the economic, legal, social and ethical implications of accessing and using information.
Reflect on, review and evaluate the information management process.
| | C5 |
Respect fundamental rights and equality between men and women.
Be respectful of and promote human rights and the principles of universal accessibility, equal opportunities, non-discrimination and universal accessibility for th
ose with special educational needs.
Be respectful of the values of a culture of peace and democracy.
|
Topic |
Sub-topic |
Introducció. |
Introducció i conceptes preliminars.
|
Capítol 1. Litografia ultraviolada i visible. |
Concepte de litografia òptica. Litografia òptica convencional. Resines. Instrumentació. La microelectrònica com la força impulsora de la miniaturització. Límits de la litografia òptica. Litografia òptica avançada.
|
Capítol 2. Litografia de feix d'electrons. |
Introducció a la litografia de feix d'electrons. Òptica amb electrons: Sistemes de litografia de feix d'electrons (Electron beam lithography, EBL). Les interaccions electrons-materials sòlids. Exposició: Resines. Efectes de proximitat. Tecnologia del procés. Aplicacions.
|
Capítol 3. Tecnologia de feix d'ions focalitzat. |
Interacció ió-sòlid. Polvorització i Redepòsit. Acanalament. Electrons secundaris. Feixos de ions focalitzats (FIB). Atac iònic i atac iònic assistit per gas. Dipòsit per gas assistit per ions. Sistemes FIB d'un sol feix i de doble feix. Litografia per feix d'ions. Nanomanipulació. Aplicacions.
|
Capítol 4. Tècniques litogràfiques no convencionals I: tècniques de AFM. |
Litografies basades en microscopies de camp proper: Introducció a la microscòpia de sonda de rastreig. Resum dels mètodes litogràfics de sonda de rastreig. Manipulació atòmica (STM). La manipulació dels objectes i les molècules. Indentació / repositori local. Nanolitografia d'oxidació local. Dispensat local de líquids i molècules (incloent Dip Pen nanolithography). Nanofabricació en paral•lel.
|
Capítol 5. Tècniques litogràfiques no convencionals II: impressió, estampat i tècniques d'AFM. |
Litografies d'estampat. Termoplàstics: temperatura de transició vítria. Estampat en calent i nanoimpressió. Curat de termoplàstics mitjançant llum ultraviolada. Replicat. Litografies suaus
|
Capítol 6. Tècniques de dipòsit i creixement.
|
Procés de creixement. Evaporació. Epitàxia de feixos moleculars. Polvorització catòdica. Dipòsit assistit per ions. Ablació amb làser. Dipòsit de fase química Dipòsit assistit mitjançant plasma. Mètode de dipòsit de Langmuir-Blodgett.
|
Capítol 7. Processament de capes. |
Gravat mitjançant química seca i humida. Processos de lift-off. Gravat reactiu i assistit mitjançant plasma. Gravat iònic.
|
Capítol 8. Processos de fabricació global. |
Fabricació d'estructures complexes utilitzant les tècniques descrites en els temes anteriors. Proposta d'alternatives i complementarietat de tècniques. |
Methodologies :: Tests |
|
Competences |
(*) Class hours
|
Hours outside the classroom
|
(**) Total hours |
Introductory activities |
|
1 |
0 |
1 |
Lecture |
|
25 |
50 |
75 |
Assignments |
|
6 |
12 |
18 |
Presentations / expositions |
|
4 |
4 |
8 |
Personal tuition |
|
3 |
4.5 |
7.5 |
|
Extended-answer tests |
|
1 |
2 |
3 |
|
(*) On e-learning, hours of virtual attendance of the teacher. (**) The information in the planning table is for guidance only and does not take into account the heterogeneity of the students. |
Methodologies
|
Description |
Introductory activities |
Una sessió introductòria per tal de proporcionar una visió general de l'assignatura i el seu paper en el marc de la nanociència i la nanotecnologia. |
Lecture |
Sessions cobrint els principis bàsics, modes d’operació, aplicacions i limitacions fonamentals de les tècniques de nanofabricació i nanoprocessat |
Assignments |
Exercicis individuals i petites presentacions a classe sobre un tema molt específic que els estudiants han de treballar i presentar individualment. |
Presentations / expositions |
Els estudiants es dividiran en grups i cada grup durà a terme una exposició oral sobre el treball que han desenvolupat durant el curs. |
Personal tuition |
Reunions amb els estudiants, ja sigui de forma individual o grupal, per tal de millorar el seu rendiment. |
Description |
Dr. Albert Romano:
Prof. Albert Romano-Rodriguez
Professor Titular d'Universitat
MIND-IN2UB - Departament d'Electronica
Universitat de Barcelona
c/ Marti i Franques, 1
E-08028 Barcelona
Spain
tel: +34 93 403 91 56
FAX: +34 93 402 11 48
e-mail: aromano@el.ub.es
Dr. Francesc Pérez-Murano:
Prof. Francesc Perez-Murano
NEMS and Nanofabrication
IMB-CNM. CSIC
CAMPUS UAB. 08193 Bellaterra.Spain
Phone: +34 93 594 77 00 (ext. 2113)
e-mail: francesc.perez@imb-cnm.csic.es
Dr. Manuel Varela:
M. Varela
Applied Physics and Optics Dept.
University of Barcelona
c/ Martí i Franquès, 1
08028 Barcelona
mvarela@ub.edu
|
Methodologies |
Competences
|
Description |
Weight |
|
|
|
|
Assignments |
|
Treballs en grup sobre un tema molt específic que els estudiants han de treballar i presentar. |
10-20% |
Presentations / expositions |
|
Els estudiants es dividiran en grups i cada grup durà a terme una exposició oral sobre el treball que han desenvolupat durant el curs. |
30-40% |
Extended-answer tests |
|
proves on han de desenvolupar una o més temàtiques |
40-60% |
Others |
|
|
|
|
Other comments and second exam session |
Durant les proves avaluatives, els telèfons mòbils, tablets i altres aparells alectrònics que no siguin expressament autoritzats per la prova, han d'estar apagats i fora de la vista |
Basic |
M.J. Madou , Fundamentals of microfabrication: the science of miniaturization. , CRC Press , 2002
B. Bushan et al. , Springer Handbook of Nanotechnology , Springer, 2006
J.N. Helbert, Handbook of VLSI Microlithography - Principles, Tools, Technology and Applications. , William Andrew Publishing/Noyes , 2001
H.S. Nalwa (editor) , Encyclopedia of nanoscience and nanotechnology , American Scientific Publishers , 2004
Z. Cui , Micro-Nanofabrication: Technology and Applications , Springer Verlag , 2006
M. Ohring , Materials Science of Thin Films , Academic Press , 2002
J.A. Venables , Introduction to Surface and Thin Film Processes , Cambridge University Press , 2001
|
|
Complementary |
|
Journals in the field of Nanotechnology Applied Physics and Chemical Synthesis Proceedings of conferences in the field of the
subject |
Subjects that are recommended to be taken simultaneously |
CLEAN ROOM TRAINING/20705207 |
|
(*)The teaching guide is the document in which the URV publishes the information about all its courses. It is a public document and cannot be modified. Only in exceptional cases can it be revised by the competent agent or duly revised so that it is in line with current legislation. |
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