| Competences |
| Type A | Code | Competences Specific |
| A1.1 | A1.1. Successfully studying and learning about the chosen research ambit: evaluating the technical and scientific importance, the technological potential and the viability of the nanoscience, design, preparation, properties, processes, developments, techniques and applications of materials. | |
| Type B | Code | Competences Transversal |
| B1.1 | B1.1. Communicating and discussing proposals and conclusions in specialized and non-specialized multilingual forums in a clear and unambiguous manner. | |
| B3.1 | B3.1. Collaborative teamwork, with responsibility shared among multidisciplinary, multilingual and multicultural teams. | |
| B4.2 | B4.2 Learning autonomously and by using initiative. | |
| Type C | Code | Competences Nuclear |
| C1.1 | Have an intermediate mastery of a foreign language, preferably English | |
| C1.2 | Be advanced users of the information and communication technologies | |
| C1.3 | Be able to manage information and knowledge |
| Learning outcomes |
| Type A | Code | Learning outcomes |
| A1.1 |
A1.1 Can formulate knowledge about the basic principles used in the field of nanofabrication and nanoprocessing, materials and the main techniques used in this area. A1.1 Select the most appropriate nanofabrication methods to solve specific problems of nanotechnology. | |
| Type B | Code | Learning outcomes |
| B1.1 |
B1.1 Can intervene effectively and transmit relevant information. B1.1 Plan their communication: generate ideas, seek information, select and order information, make schemes, decide on the audience and the aims of the communication, etc. B1.1 Prepare and deliver structured presentations, complying with the requirements. B1.1 Draft documents with the appropriate format, content, structure, language accuracy, and register, and can illustrate concepts using the correct conventions: format, headings, footnotes, captions, etc. B1.1 Use language that is appropriate to the situation. B1.1 Are aware of the strategies that can be used in oral presentations (audiovisual support, eye contact, voice, gesture, timing, etc.). | |
| B3.1 |
B3.1 Accept and comply with the rules of the group. B3.1 Take active part in planning the team’s work, distributing tasks and respecting deadlines. B3.1 Contribute to the positive management of any differences, disagreements and conflicts that arise in the team. B3.1 Make their personal contribution in the time expected and with the resources available. B3.1 Take active part and share information, knowledge and experiences. B3.1 Take into account the points of view of others and give constructive feedback. | |
| B4.2 |
B4.2 Ask the appropriate questions for solving doubts or open questions, and search for information with criteria. B4.2 Select a procedure from among the possibilities suggested by the lecturer. | |
| Type C | Code | Learning outcomes |
| C1.1 |
Express opinions on abstract or cultural topics in a limited fashion. Explain and justify briefly their opinions and projects. Understand instructions about classes or tasks assigned by the teaching staff. Understand routine information and articles. Understand the general meaning of texts that have non-routine information in a familiar subject area. Write letters or take notes about foreseeable, familiar matters. | |
| C1.2 |
Understand basic computer hardware. Understand the operating system as a hardware manager and the software as a working tool. Use software for off-line communication: word processors, spreadsheets and digital presentations. Use software for on-line communication: interactive tools (web, moodle, blogs, etc.), e-mail, forums, chat rooms, video conferences, collaborative work tools, etc. | |
| C1.3 |
Locate and access information effectively and efficiently. Critically evaluate information and its sources, and add it to their own knowledge base and system of values. Have a full understanding of the economic, legal, social and ethical implications of accessing and using information. Reflect on, review and evaluate the information management process. |
| Contents |
| Topic | Sub-topic |
| Introduction | Introduction and preliminary concepts. |
| Chapter 1. Optical lithography | Concept of optical lithography. Conventional optical lithography. Resist. Instrumentation. Microelectronics as the driving force for miniaturization. Limits of optical lithography. Advanced optical lithography. |
| Chapter 2. Electron beam lithography. | Introduction to electron beam lithography. Optical electron systems: electron-beam lithography (EBL). Solids-electron interactions. Beam exposition: Resists. Proximity effects. Process technology. Applications. |
| Chapter 3. Focussed ion beam technology. | Basics of ion-beam-solid interactions:Interactions of the ions with a target: -Implantation of the primary ions -Damage of the structure -Emission of secondary atoms or ions (sputtering) -Emission of secondary electrons -Emission of secondary electrons -Backscattering -Deposition of molecules -Ion channelling FIB apparatus and Dual-Beam Examples of FIB in the field of analysis Examples of applications Summary |
| Chapter 4. Non-conventional lithographyc techniques I: Atomic Force Microscopies. | Lithographs based on near field microscopy: Introduction to scanning probe microscopy (SPM). Summary of scanning probe lithographic methods. Atomic manipulation (STM). Manipulation of objects and molecules. Indentation / local repository. Local oxidation nanolithography. Local dispensing of liquids and molecules (including Dip pen nanolithography). Nanofabrication in parallel. |
| Chapter 5. Non-conventional lithographyc techniques II: Embossing, imprinting and soft lithographies. | Imprinting and embossing techniques. Thermoplastics: vitrious transition temperature. Hot embossing and NanoImprint Lithography (NIL). Curing of resists using UV light. Replica molding. Soft lithographies. |
| Chapter 6. Thin film deposition and growth. |
Introduction. Thin film growth. Surface structure. Stages and processes. Epitaxy. Deposition techniques. Physical techniques (PVD). Chemical techniques (CVD). PCVD techniques. Thin film characterization. In situ techniques. Ex situ techniques. Growth and Deposition Techniques. |
| Chapter 7. Thin film processing. | Wet etching. Lift-off process. Plasma assisted etching. Reactive ion etching Etching techniques. Dry etching. Vapour phase etching. Sputtering ion etching |
| Chapter 8. Global fabrication processes. | Fabrication of complex structures using the techniques described in the previous topics. Proposed alternative and complementary techniques. |
| Planning |
| Methodologies :: Tests | ||||||||||
| Competences | (*) Class hours |
Hours outside the classroom |
(**) Total hours | |||||||
| Introductory activities |
|
1 | 0 | 1 | ||||||
| Lecture |
|
25 | 50 | 75 | ||||||
| Assignments |
|
6 | 12 | 18 | ||||||
| Presentations / expositions |
|
4 | 4 | 8 | ||||||
| Personal tuition |
|
3 | 4.5 | 7.5 | ||||||
| Extended-answer tests |
|
1 | 2 | 3 | ||||||
| (*) On e-learning, hours of virtual attendance of the teacher. (**) The information in the planning table is for guidance only and does not take into account the heterogeneity of the students. | ||||||||||
| Methodologies |
| Description | |
| Introductory activities | Activities to make contact and collect student information. Presentation of the subject. |
| Lecture | Delivery and explanation of the contents of the course. |
| Assignments | Work done by the student. |
| Presentations / expositions | Oral presentation by students of a particular subject or a (previously written presentation). |
| Personal tuition | Time that each lecturer has booked to attend and answer questions to students. |
| Personalized attention |
| Description |
| Dr. Albert Romano: Prof. Albert Romano-Rodriguez Professor Titular d'Universitat MIND-IN2UB - Departament d'Electronica Universitat de Barcelona c/ Marti i Franques, 1 E-08028 Barcelona Spain tel: +34 93 403 91 56 FAX: +34 93 402 11 48 e-mail: aromano@el.ub.es Dr. Francesc Pérez-Murano: Prof. Francesc Perez-Murano NEMS and Nanofabrication IMB-CNM. CSIC CAMPUS UAB. 08193 Bellaterra.Spain Phone: +34 93 594 77 00 (ext. 2113) e-mail: francesc.perez@imb-cnm.csic.es Dr. Manuel Varela: M. Varela Applied Physics and Optics Dept. University of Barcelona c/ Martí i Franquès, 1 08028 Barcelona mvarela@ub.edu Xavier Borrisé (CNM-CSIC and ICN) Nanolithography Laboratory CAMPUS UAB. 08193 Bellaterra.Spain Phone: +34 93 5947700 ext 1104 e-mail: xavier.borrise@imb-cnm.csic.es |
| Assessment |
| Methodologies | Competences | Description | Weight | ||||
| Assignments |
|
Group work on a very specific subject that students must work and present. | 10-20% | ||||
| Presentations / expositions |
|
Students will be divided into groups and each group will conduct an oral exposition on the work they have developed during the course. | 30-40% | ||||
| Extended-answer tests |
|
Tests which must develop one or ore topics | 40-60% | ||||
| Others |
| Other comments and second exam session | |||
|
During testing assessment, mobile phones, tablets and other devices that are not expressly authorized alectrònics for the test must be switched off and out of sight |
|||
| Sources of information |
| Basic |
M.J. Madou , Fundamentals of microfabrication: the science of miniaturization. , CRC Press , 2002
B. Bushan et al. , Springer Handbook of Nanotechnology , Springer, 2006
J.N. Helbert, Handbook of VLSI Microlithography - Principles, Tools, Technology and Applications. , William Andrew Publishing/Noyes , 2001
H.S. Nalwa (editor) , Encyclopedia of nanoscience and nanotechnology , American Scientific Publishers , 2004
Z. Cui , Micro-Nanofabrication: Technology and Applications , Springer Verlag , 2006
M. Ohring , Materials Science of Thin Films , Academic Press , 2002
J.A. Venables , Introduction to Surface and Thin Film Processes , Cambridge University Press , 2001 |
||||||||
| Complementary | |||||||||
Journals in the field of Nanotechnology Applied Physics and Chemical Synthesis Proceedings of conferences in the field of the subject |
|||||||||
| Recommendations |
| Subjects that are recommended to be taken simultaneously | ||
|
||
(*)The teaching guide is the document in which the URV publishes the information about all its courses. It is a public document and cannot be modified. Only in exceptional cases can it be revised by the competent agent or duly revised so that it is in line with current legislation.