Educational guide School of Chemical Engineering |
english |
Nanoscience, Materials and Processes: Chemical Technology at the Frontier |
![]() |
![]() |
![]() |
IDENTIFYING DATA | 2017_18 |
Subject | NANOFABRICATION AND NANOPROCESSING | Code | 20705206 | |||||
Study programme |
|
Cycle | 2nd | |||||
Descriptors | Credits | Type | Year | Period | ||||
4.5 | Optional | AN |
Competences | Learning outcomes | Contents |
Planning | Methodologies | Personalized attention |
Assessment | Sources of information | Recommendations |
Topic | Sub-topic |
Introduction | Introduction and preliminary concepts. |
Chapter 1. Thin film deposition and growth. |
Introduction. Thin film growth. Surface structure. Stages and processes. Epitaxy. Deposition techniques. Physical techniques (PVD). Chemical techniques (CVD). PCVD techniques. Thin film characterization. In situ techniques. Ex situ techniques. Growth and Deposition Techniques. |
Chapter 2. Optical lithography | Concept of optical lithography. Conventional optical lithography. Resist. Instrumentation. Microelectronics as the driving force for miniaturization. Limits of optical lithography. Advanced optical lithography. |
Chapter 3. Electron beam lithography. | Introduction to electron beam lithography. Optical electron systems: electron-beam lithography (EBL). Solids-electron interactions. Beam exposition: Resists. Proximity effects. Process technology. Applications. |
Chapter 4. Focussed ion beam technology. | Basics of ion-beam-solid interactions:Interactions of the ions with a target: -Implantation of the primary ions -Damage of the structure -Emission of secondary atoms or ions (sputtering) -Emission of secondary electrons -Emission of secondary electrons -Backscattering -Deposition of molecules -Ion channelling FIB apparatus and Dual-Beam Examples of FIB in the field of analysis Examples of applications Summary |
Chapter 5. Non-conventional lithographyc techniques I: Atomic Force Microscopies. | Lithographs based on near field microscopy: Introduction to scanning probe microscopy (SPM). Summary of scanning probe lithographic methods. Atomic manipulation (STM). Manipulation of objects and molecules. Indentation / local repository. Local oxidation nanolithography. Local dispensing of liquids and molecules (including Dip pen nanolithography). Nanofabrication in parallel. |
Chapter 6. Non-conventional lithographyc techniques II: Embossing, imprinting and soft lithographies. | Imprinting and embossing techniques. Thermoplastics: vitrious transition temperature. Hot embossing and NanoImprint Lithography (NIL). Curing of resists using UV light. Replica molding. Soft lithographies. |
Chapter 7. Thin film processing. | Wet etching. Lift-off process. Plasma assisted etching. Reactive ion etching Etching techniques. Dry etching. Vapour phase etching. Sputtering ion etching |
Chapter 8. Global fabrication processes. | Fabrication of complex structures using the techniques described in the previous topics. Proposed alternative and complementary techniques. |